Meet KxS and SPS expert teams. Get a live demonstration of the KxS DCM-10 Semiconductor Chemical Monitor and explore how real-time concentration insight can improve your wet chemical processes.
Designed for inline optical measurement, DCM-10 supports incoming chemical checks, wafer cleaning, chemical etching and chemical mechanical planarization (CMP).
Explore applications such as:
- Checking incoming chemical concentration and CMP slurry dilution.
- Monitoring H₂O₂ addition and DI water dilution in CMP slurry preparation.
- Correlating chemical concentration with wafer etch rates in buffered oxide etch (BOE).
- Optimizing bath life for post-etch residue removers such as EKC265™.
From chemical delivery to point of use, make concentration changes visible and turn that insight into better process control.
