Semicon Europa 2025

When it comes to balancing cost, speed, and accuracy in semiconductor wet chemical control throughout the fab distribution chain, in-situ refractive index measurement has become the industry standard. It is an essential tool for concentration monitoring at incoming chemical check, wafer cleaning, chemical etching and chemical mechanical planarization (CMP).

Meet our Technical Sales Engineer, Anupama Bhandari, and learn how you can achieve better precision and consistency in your critical wafer handling operations, including:

• Chemical blend checksum of SC-1, SC-2
• Hard mask etching with NH₃ water mixes
• Silicon wet etch with 50% KOH
• Titanium etch with H₂SO₄:HNO₃:H₃PO₄ mixes
• Back-side poly etch with HF:HNO₃ mixes
• Post-CMP cleans with complex chemical blends

We’re thrilled to meet you in Munich!