inline fab wet chemical concentration

SEMICONDUCTOR
DCM-10

 
DCM-10 INLINE CONCENTRATION MONITOR
FOR CRITICAL FAB WET CHEMICALS IS DESIGNED TO:
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  • DEFINE incoming clean chemicals (SC-1, SC-2, dHF) and raw CMP slurry density.
  • ACHIEVE AND ENSURE H2O2 concentration in CMP slurries for copper, tungsten and interlayer dielectric applications.
  • CORRELATE etch rate ER in e.g. wafer backside poly etch HF:HNO3 and buffered oxide etch BOE.
  • OPTIMIZE bath life of post-etch residue removers like EKC265™ and other solvents in wet strip tools.
IN-SITU CONCENTRATION MONITORING
IN WET WAFER CLEANING TOOLS
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  • Map and reduce chamber to chamber variability.
  • Optimize the chemical bath. In the hot SC-2 sequence the data shows a slight decreasing trend.
    May indicate H2O2 degradation.
  • DIW rinse time may be reduced for higher throughput.
    Proof would be Photo Limited Yield and Metal 1-Layer test in defect characterization.
  • Fault detection.
Patent pending
OPTIMAL FLOW PATH IN FULL-BORE FLOW
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Unique laminar flow path in the internal locus adjacent to the measurement window imposes no shear forces on sensitive fluids nor process pressure drop. A tube end full-bore flow cell design allows for standard pipe connection options like: Flare, Pillar type, PrimeLock® or welding.

USER INTERFACE AND INTEGRATION
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All measurement functions are integrated in the sensor in a stand-alone setup, no transmitter required. Measurement output options are chosen in analog or digital communication protocols. Two cable connection ports are available: Dual analog 4-20mA and Modbus TCP.  External displays of different sizes are readily available and connected through the sensor digital port. Computer, tablet or mobile phone with a web browser serves as user interface for accessing sensor diagnostics and settings. When digital communication is chosen, the sensor Modbus TCP communication is connected directly with PLCs or converted to other industry standard protocols.  
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